Oxford Instruments is continuing its successful series of workshops with a one day event in Grenoble, France.
This workshop is open to all those people working in industry and academia, with an interest in recent progress in research and development, plus future trends in the fabrication and application of micro & nano structures and devices.
Our workshops are very popular and get booked fast, so please ensure you have a place by booking now!
Venue: Minatec, Grenoble, France
Timing: 8.30am - 3.30pm
Presentations, Discussions, and a networking lunch
This one day seminar will focus on latest innovations in MEMS, Ion Beam, Atomic Layer Deposition, Silicon and III-V Etch and more.
Talks:
- III-V Etching for nanowire applications
- MEMS etch developments
- Recent progress in GaN power rectifier
- InP and GaAs etching developments
- Developments in Ion Beam etch and deposition
- Si etch using PlasmaPro NGP80
- ALD overview: Technology & results
- Plasma sources & developing plasma etch processes
Speakers
We are delighted that the following speakers have agreed to participate:
Meeting Chair: Thibault David from LETI
Prof Daniel Alquier, Directeur, LMP, Tours
Dr Alex Robinson, Birmingham University, UK
Dr Francois Neuilly, IEMN, Lille, France
And speakers from Oxford Instruments Plasma Technology:
Dr Mike Cooke, Chief Technology Officer
Dr Sebastien Pochon, Ion Beam
Dr Dave Pearson, Ion Beam
Dr Ligang Deng, III-V etch
Knut Beekmann, PV and Deep Si Etch
Chris Hodson, ALD
Networking Lunch
There is no charge for this workshop, however advance booking is essential. For more information or to book a place please click here
(Talks will be in English or French at the speakers' choice)